Coupling models and algorithms for 3d topography simulation: Plasma etching, lon milling and deposition in SAMPLE-3D

Workshop on Numerical Modeling of Processes and Devices for Integrated Circuits, NUPAD 1992

Volumn , Issue , 1992, Pages 9-14

  Schecklert, Edward W ^a,b   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MILLING (MACHINING); NUMERICAL MODELS; PHYSICAL VAPOR DEPOSITION; PLASMA ETCHING; TOPOGRAPHY; VISIBILITY;

3D TOPOGRAPHY SIMULATIONS; IMPLEMENTATION SUPPORT; LOCAL MATERIALS; MODELS AND ALGORITHMS; PHYSICAL PROCESS; PHYSICAL VAPOR DEPOSITION PROCESS; TRIANGULAR FACETS; VISIBILITY CALCULATION;

THREE DIMENSIONAL COMPUTER GRAPHICS;

EID: 84988793524     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/NUPAD.1992.673839     Document Type: Conference Paper

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