Dual-responsive copolymer poly(2,2,3,4,4,4-hexafluorobutyl methacrylate)-block-poly[2-(dimethylamino)ethyl methacrylate] synthesized via photoATRP for surface with tunable wettability

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 54, Issue 24, 2016, Pages 3868-3877

  Chen, Zhi Chao ^a   Zhu, Bo Chao ^b   Li, Jin Jin ^a   Zhou, Yin Ning ^a   Luo, Zheng Hong ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b PetroChina Lanzhou Petrochemical Ltd   (China)

Author keywords

fluoropolymers; pH responsive polymers; thermal responsive polymers; tunable wettability

Indexed keywords

ATOM TRANSFER RADICAL POLYMERIZATION; BLOCK COPOLYMERS; FLUORINE CONTAINING POLYMERS; FREE RADICAL REACTIONS; HYDROPHILICITY; PROTONATION; SILICON WAFERS; WETTING;

2-(DIMETHYLAMINO)ETHYL METHACRYLATE; CHAIN CONFORMATIONS; MORPHOLOGY AND COMPOSITION; PH-RESPONSIVE POLYMER; RESPONSIVE POLYMER; SILICON WAFER SURFACE; TERTIARY AMINE GROUPS; TUNABLE WETTABILITIES;

PLASTIC COATINGS;

EID: 84988384143     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.28357     Document Type: Article

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