Low temperature direct growth of graphene patterns on flexible glass substrates catalysed by a sacrificial ultrathin Ni film

Optical Materials Express

Volumn 6, Issue 8, 2016, Pages 2487-2507

  Marchena, Miriam ^a   Janner, Davide ^a   Chen, Tong Lai ^a   Finazzi, Vittoria ^a   Pruneri, Valerio ^a,b  

^a BARCELONA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Spain)

^b INSTITUCIÓ CATALANA DE RECERCA I ESTUDIS AVANÇATS ICREA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GLASS; OPTOELECTRONIC DEVICES; SUBSTRATES; TEMPERATURE; ULTRATHIN FILMS;

CATALYTIC SURFACES; CHEMICAL VAPOR DEPOSITIONS (CVD); CRITICAL TEMPERATURES; DIRECT DEPOSITION; LOW GROWTH TEMPERATURE; SUBSTRATE MATERIAL; TRANSFER TECHNIQUE; ULTRATHIN NI FILMS;

GRAPHENE;

EID: 84983688810     PISSN: None     EISSN: 21593930     Source Type: Journal    
DOI: 10.1364/OME.6.002487     Document Type: Article

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