Current Progress in the Chemical Vapor Deposition of Type-Selected Horizontally Aligned Single-Walled Carbon Nanotubes

ACS Nano

Volumn 10, Issue 8, 2016, Pages 7248-7266

  Ibrahim, Imad ^b   Gemming, Thomas ^c   Weber, Walter M ^b,d   Mikolajick, Thomas ^b,d,e   Liu, Zhongfan ^a,f   Rümmeli, Mark H ^a,c,g  

^a SOOCHOW UNIVERSITY   (China)

^b NaMLab GGmbH   (Germany)

^c IFW DRESDEN   (Germany)

^d CENTER FOR ADVANCING ELECTRONICS DRESDEN CFAED   (Germany)

^e DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^f PEKING UNIVERSITY   (China)

^g CENTRE OF POLYMER AND CARBON MATERIALS   (Poland)

Author keywords

CNT etching; single walled carbon nanotubes; SWCNT characterization; type selected CNT

Indexed keywords

CARBON NANOTUBES; CHEMICAL VAPOR DEPOSITION; DEPOSITION; NANOTUBES; STEREOCHEMISTRY; VAPOR DEPOSITION; YARN;

ALIGNED SINGLE-WALLED CARBON NANOTUBES; DEPOSITION TECHNIQUE; DIRECT FABRICATIONS; ELECTRONIC MATERIALS; MANUFACTURING CHALLENGES; NANOTUBE DEVICES; SPATIAL LOCATION; TYPE-SELECTED CNT;

SINGLE-WALLED CARBON NANOTUBES (SWCN);

EID: 84983486017     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/acsnano.6b03744     Document Type: Review

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