Spike annealing of silicon wafers using millimeter-wave power

9th International Conference on Advanced Thermal Processing of Semiconductors, RTP 2001

Volumn , Issue , 2001, Pages 232-239

  Bykov, Yu ^a   Eremeev, A ^a   Holoptsev, V ^a   Plotnikov, I ^a   Zharova, N ^a  

^a INSTITUTE OF APPLIED PHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

HEAT TREATMENT; MICROWAVE HEATING; MILLIMETER WAVES; RAY TRACING; WAVE POWER;

COOLING RATES; GYROTRON SYSTEMS; MICROWAVE ABSORPTIVITY; MICROWAVE INTENSITY; MILLIMETER-WAVE HEATING; NON-UNIFORMITIES; SPIKE ANNEAL; SPIKE ANNEALING;

SILICON WAFERS;

EID: 84983134042     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RTP.2001.1013771     Document Type: Conference Paper

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