Metal-Organic Framework Thin Films as Platforms for Atomic Layer Deposition of Cobalt Ions to Enable Electrocatalytic Water Oxidation

ACS Applied Materials and Interfaces

Volumn 7, Issue 51, 2015, Pages 28223-28230

  Kung, Chung Wei ^a,b   Mondloch, Joseph E ^a   Wang, Timothy C ^a   Bury, Wojciech ^a,c   Hoffeditz, William ^a,d   Klahr, Benjamin M ^a,d   Klet, Rachel C ^a   Pellin, Michael J ^d   Farha, Omar K ^a,e   Hupp, Joseph T ^a,d  

^a NORTHWESTERN UNIVERSITY   (United States)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c WARSAW UNIVERSITY OF TECHNOLOGY   (Poland)

^d ARGONNE NATIONAL LABORATORY   (United States)

^e KING ABDULAZIZ UNIVERSITY   (Saudi Arabia)

Author keywords

atomic layer deposition; cobalt oxide; electrocatalyst; metal organic frameworks; pyrene; water oxidation

Indexed keywords

ATOMIC LAYER DEPOSITION; ATOMS; COBALT; CONDUCTIVE FILMS; CRYSTALLINE MATERIALS; DEPOSITION; ELECTROCATALYSTS; GLASS; IONS; JAVA PROGRAMMING LANGUAGE; ORGANIC POLYMERS; ORGANOMETALLICS; OXIDATION; PYRENE; SUBSTRATES; SURFACE REACTIONS;

COBALT OXIDES; CONDUCTING GLASS; ELECTROCATALYTIC; ELECTROCATALYTIC ACTIVITY; METAL ORGANIC FRAMEWORK; SURFACE MEDIATED REACTION; THREE DIMENSIONAL ARRAYS; WATER OXIDATION;

THIN FILMS;

EID: 84982764378     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/acsami.5b06901     Document Type: Article

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