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Volumn 605, Issue , 2016, Pages 11-18

Plasma-on-chip device for stable irradiation of cells cultured in media with a low-temperature atmospheric pressure plasma

Author keywords

Low temperature atmospheric pressure plasma; Micro nano electromechanical systems; Plasma medicine; Plasma on chip; Single cell analysis

Indexed keywords

ARTICLE; ATMOSPHERIC PRESSURE; CELL CULTURE; GREEN ALGA; IRRADIATION; LOW TEMPERATURE; MICROELECTROMECHANICAL SYSTEM; NONHUMAN; PLASMA ON CHIP; PRIORITY JOURNAL; SACCHAROMYCES CEREVISIAE; SPECTROSCOPY; SURFACE PROPERTY; CHEMISTRY; CHLORELLA; COLD; CULTURE MEDIUM; CYTOLOGY; EQUIPMENT DESIGN; MICROELECTRODE; PLASMA GAS;

EID: 84979641434     PISSN: 00039861     EISSN: 10960384     Source Type: Journal    
DOI: 10.1016/j.abb.2016.04.001     Document Type: Article
Times cited : (14)

References (33)
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    • Sze, S.M.1    Lee, M.-K.2
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  • 28
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    • Insulator films of 8 μm and 6.4 μm were obtained by spin-coating at 4000 rpm for 40 s and 7000 rpm for 180 s, respectively. To obtain the thinner insulator film, spin-coating was conducted at 7000 rpm for 180 s in a box type vacuum chuck. Because of an enclosed condition, drying of the resist was suppressed resulting in the insulator film of 2.4 μm.
    • [28] Insulator films of 8 μm and 6.4 μm were obtained by spin-coating at 4000 rpm for 40 s and 7000 rpm for 180 s, respectively. To obtain the thinner insulator film, spin-coating was conducted at 7000 rpm for 180 s in a box type vacuum chuck. Because of an enclosed condition, drying of the resist was suppressed resulting in the insulator film of 2.4 μm.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.