Refractive-index dispersion of phosphosilicate glass, thermal oxide, and silicon nitride films on silicon

Applied Optics

Volumn 27, Issue 19, 1988, Pages 4104-4109

  Lee, H J ^a   Henry, C H ^a   Orlowsky, K J ^a   Kazarinov, R F ^a   Kometani, T Y ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84975662188     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.27.004104     Document Type: Article

References (11)

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3. 4-Si02 Optical Waveguides on Si,” Appl. Opt. 26, 2621 (1987).
4. N. Takato, M. Yasu, and M. Kawachi, “Low-Loss High Silica Single Mode Channel Waveguides,” Electron. Lett. 22, 321, (1986).
5. A. Naumann and J. T. Boyd, “Ring Resonators Fabricated in Phosphosilicate Glass Films Deposited by Chemical Vapor Deposition,” J. Lightwave Technol. LT-4, 1294 (1986).
6. B. H. Verbeek, C. H. Henry, N. A. Olsson, K. J. Orlowsky, R. F. Kazarinov, and B. H. Johnson, “Integrated Four-Channel Mach-Zehnder Multi/Demultiplexer Fabricated with Phosphorous Doped Si02 Waveguides on Si,” IEEE/OSA J. Lightwave Technol. LT-6, 1011 (1988).
7. R. M. Levin and A. C. Adams, “Low Pressure Deposition of Phosphosilicate Glass Films,” J. Electrochem. Soc. 129, 1588 (1982).
8. D. L. Wood (unpublished).
9. J. W. Fleming and D. L. Wood, “Refractive Index Dispersion and Related Properties in Flourine Doped Silica,” Appl. Opt. 22, 3102 (1983).
10. N. Shibata and T. Edahiro, “Refractive-Index Dispersion for Ge02, P2O5, and B2O3 Doped Silica Glasses in Optical Fibers,” Trans. IECE Jpn. 65, 166 (1982).
11. R. A. Levy and T. Y. Kometani, “Analysis of Borophosphosili-cate Glass Films by Inductively Coupled Plasma-Atomic Emission Spectroscopy,” J. Electrochem. Soc. 134, 1565 (1987).