Optical properties of vanadium dioxide and vanadium pentoxide thin films

Applied Optics

Volumn 30, Issue 19, 1991, Pages 2782-2787

  Chain, Elizabeth E ^a  

^a UNIVERSITY OF TEXAS AT DALLAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84975646305     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.30.002782     Document Type: Article

References (43)

1. F. J. Morin, “Oxides Which Show a Metal-to-Insulator Transi-tion at the Neel Temperature,” Phys. Rev. Lett. 3, 34-36 (1959).
2. D. Adler, “Mechanisms for Metal-Nonmetal Transitions in Transition-Metal Oxides and Sulfides,” Rev. Mod. Phys. 40, 714-736 (1968).
3. D. I. Bilenko, O. Y. Belobrovaya, E. A. Zharkova, L. A. Ryabova, A. Serbinov, and E. I. Khasina, “Investigation of the Proper-ties of Vanadium Dioxide in the Millimeter Wavelength Range Near the Metal-Semiconductor Phase Transition,” Sov. Phys. Solid State 18, 1153-1155 (1976).
4. B. S. Borisov, S. T. Koretskaya, V. G. Mokerov, A. V. Rakov, and S.G. Solovev, “Electrical and Optical Properties of VO2 Near the Semiconductor-Semimetal Transition Point,” Sov. Phys. Solid State 12, 1763-1769 (1971).
5. C. H. Griffiths and H. K. Eastwood, “Influence of Stoichiometry on the Metal-Semiconductor Transition in Vanadium Dioxide,” J. Appl. Phys. 45, 2201 (1974).
6. K. Kosuge, “The Phase Diagram and Phase Transition of the V203-V205 System,” J. Phys. Chem. Solids 28, 1613 (1967).
7. C. B. Greenberg, “Undoped and Doped VO2 Films Grown from VO(OC3H7)3,” Thin Solid Films 110, 73 (1983).
8. F. A. Chudnovskii, “Metal-Semiconductor Phase Transition in Vanadium Oxides and Technical Applications,” Sov. Phys. Tech. Phys. 20, 999 (1976).
9. G. V. Jorgenson and J. C. Lee, “Doped Vanadium Oxide for Optical Switching Films,” Sol. Energy Mater. 14, 205 (1986).
10. J. C. C. Fan, H. R. Fetterman, F. J. Bachner, P. M. Zavracky, and C. D. Parker, “Thin-Film VO2 Submillimeter-Wave Modulators and Polarizers,” Appl. Phys. Lett. 31, 11-13 (1977).
11. D. D. Eden, “Some Applications Involving the Semiconductor- to-Metal Phase Transition in VO2,” Proc. Soc. Photo-Opt. In-strum. Eng. 185, 97 (1979).
12. J. S. Chivian, M. W. Scott, W. E. Case, and N. J. Krasutsky, “An Improved Scan Laser with VO2 Programmable Mirror,” IEEE J. Quantum Electron. QE-21, 383-390 (1985).
13. G. S. Nadkarni and V. S. Shirodkar, “Experiment and Theory for Switching in AI/V2O5/AI Devices,” Thin Solid Films 105, 115-129 (1983).
14. S. Sato and Y. Seino, “Electrochromism in Evaporated W03- Mo03-V205 Films,” Electron. Commun. Jpn 65-C, 104-111 (1982).
15. S. F. Cogan, N. M. Nguyen, S. J. Perrotti, and R. D. Rauh, “Electrochromism in Sputtered Vanadium Pentoxide,” Proc. Soc. Photo-Opt. Instrum. Eng. 1016, 57-62 (1988).
16. E. E. Chain, “The Influence of Deposition Temperature on the Structure and Optical Properties of Vanadium Oxide Films,” J. Vac. Sci. Technol. A 4, 432-435 (1986).
17. E. E. Chain, “Effects of Oxygen in Ion-beam Sputter Deposition of Vanadium Oxide,” J. Vac. Sci. Technol. A 5, 1836-1839 (1987).
18. E. Kusano, J. A. Theil, and J. A. Thornton, “Deposition of Vanadium Oxide Films by Direct-current Magnetron Reactive Sputtering,” J. Vac. Sci. Technol. A 6, 1663-1667 (1988).
19. A. Razavi, T. Hughes, J. Antinovitch, and J. Hoffman, “Tem-perature Effects on Structure and Optical Properties of Radio-Frequency Sputtered VO2,” J. Vac. Sci. Technol. A 7, 1310-1313 (1989).
20. A. Razavi, L. Bobyak, and P. Fallon, “The Effects of Biasing and Annealing on the Optical Properties of RF Sputtered VO2,” J. Vac. Sci. Technol. A 8, 1391-1394 (1990).
21. M. Fukuma, S. Zembutsu, and S. Miyazawa, “Preparation of VO2 Thin Film and Its Direct Optical Bit Recording Character-istics,” Appl. Opt. 22, 265-268 (1983).
22. R. A. Rozgonyi and D. H. Hensler, “Structural and Electrical Properties of Vanadium Dioxide Thin Films,” J. Vac. Sci. Tech-nol. 5, 194-199 (1968).
23. E. E. Chain, “Characterization of Vanadium Oxide Optical Thin Films by X-Ray Diffractometry,” Appl. Opt. 28, 713-716 (1989).
24. G. V. Jorgenson and J. C. Lee, “Thermochromic Materials Re-search for Optical Switching Films,” Proc. Soc. Photo-Opt. In-strum. Eng. 562, 2-5 (1985).
25. K. R. Speck, H. S.-W. Hu, R. A. Murphy, and R. S. Potember, “Vanadium Dioxide Films Grown from Vanadium Tetrakis (t- Butoxide) by the Sol-Gel Process,” Mater. Res. Symp. Proc. 121, 667-672 (1988).
26. S. M. Babulanam, T. S. Eriksson, G. A. Niklasson, and C. G. Granqvist, “Thermochromic VO2 Films for Energy-Efficient Windows,” Sol. Energy Mater. 16, 347-363 (1987).
27. K. A. Khan and C. G. Granqvist, “Thermochromic Sputter- Deposited Vanadium Oxygluoride Coatings with Low Luminous Absorptance,” Appl. Phys. Lett. 55, 4 (1989).
28. F. C. Case, “Influence of Ion Beam Parameters on the Electrical and Optical Properties of Ion-Assisted Reactively Evaporated Vanadium Dioxide Thin Films,” J. Vac. Sci. Technol. A 5, 1762-1765 (1987).
29. H. Hirashima, M. Ide, and T. Yoshida, “Memory Switching of V205-Te02 Glasses,” J. Non-Cryst. Solids 86, 327-335 (1986).
30. C. R. Aita, Y.-L. Liu, M. L. Kao, and S. D. Hansen, “Optical Behavior of Sputter-Deposited Vanadium Pentoxide,” J. Appl. Phys. 60, 749-753 (1986).
31. S. D. Hansen and C. R. Aita, “Low Temperature Reactive Sput-ter Deposition of Vanadium Oxide,” J. Vac. Sci. Technol. A 3, 660-663 (1985).
32. L. Michailovits, I. Hevesi, Liem Phan, and Zs. Varga, “Determi-nation of the Optical Constants and Thickness of Amorphous V205 Thin Films,” Thin Solid Films 102, 71-76 (1983).
33. G. A. Rozgonyi and W. J. Polito, “Preparation of Thin Films of Vanadium (Di-, Sesqui-, and Pent-)Oxide,” J. Electrochem. Soc. 115, 56-57 (1968).
34. E. V. Dorozhko and V. G. Savitskii, “Optical Absorption of Vanadium Pentoxide in the ^Energy Range 1.0-5.5 eV,” Soc. Phys. Solid State 19, 555-557 (1977).
35. E. E. Chain and D. M. Byrne, “Microstructural Information Related to Thin Film Optical Measurements,” Thin Solid Films 181, 323-332 (1989).
36. E. E. Chain, “Infrared Optical Properties of Vanadium Oxide Thin Films,” IEEE Catalog No. 89TH0257-6 (IEEE, New York, 1989), pp. 229-232.
37. V. I. Belyakov, V. A. Dmitriyev, V. N. Kornetov, V. V. Mokrou- sov, and L. A. Orlov, “Optical Constants of Two-Phase Vanadi-um Dioxide Films,” Avtometriia, 5, 114-116 (1981).
38. A. A. Bugaev, B. P. Zakharchenya, and F. A. Chudnovskii, “Use of Vanadium Oxide Films as a Holographic Recording Me-dium,” Sov. J. Quantum Electron. 9, 855-857 (1979).
39. M. Thomas and E. E. Chain, “Free Carrier Plasma Diagnostics of Vanadium Dioxide,” in Proceedings, Ninth Symposium on Electronic Materials Processing and Characterization, Dallas, TX, (4-5 June 1990).
40. J. Daniels, C. v. Festenberg, H. Raether and K. Zeppenfeld, Optical Constants of Solids by Electron Spectroscopy (Spring- er-Verlag, Berlin, 1970), p. 78.
41. T. L. Ferrell, T. A. Callcott, and R. J. Warmack, “Plasmons and Surfaces,” Am. Sci. 73, 344-353 (1985).
42. A. Bianconi, S. Stizza, and R. Bernardini, “Critical Behavior of the Plasmon Resonance at the Metal-Insulator Transition in V02,” Phys. Rev. B 24, 4406-4411 (1981).
43. R. F. Egerton, Electron Energy-Loss Spectroscopy (Plenum, New York, 1986), p. 8.