Normal incidence reflectance of ion beam deposited sic films in the euv

Applied Optics

Volumn 27, Issue 14, 1988, Pages 2815-2816

  Keski Kuha, Ritva A M ^a   Osantowskia, John F ^a   Herzig, Howard ^a   Gum, Jeffrey S ^a   Toft, Albert R ^a  

^a NASA GODDARD SPACE FLIGHT CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84975556409     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.27.002815     Document Type: Article

References (7)

1. W. J. Choyke, W. D. Partlow, E. P. Supertzi, F. J. Venskytis, and G. B. Brandt, “Silicon-Carbide Diffraction Grating for the Vacuum Ultraviolet: Feasibility,” Appl. Opt. 16, 2013 1977.
2. W. D. Partlow, and H. Herzig, “Influence of Plasma Excitation Frequency on the Properties of a-SiC:H Produced in a Glow Discharge Plasma,” in Proceedings, MRS Conference, Symposium F: Materials Issues in Applications of Amorphous Silicon Technology, San Francisco 1985.
3. W. D. Partlow, “Develop Techniques for Applying Silicon Carbide Coatings,” Final Report, NASA contract NAS5-27679.
4. D. L. Windt, and B. Bach, “Ion Beam Deposited Silicon Carbide on Glass Optics and Replica Gratings,” Appl. Opt. 23, 3047 1984.
5. J. B. Kortright and D. L. Windt, “Amorphous Silicon Carbide Coatings for Extreme Ultraviolet Optics,” Appl. Opt. 27, 2841 1988.
6. A. P. Bradford, G. Hass, J. F. Osantowski, and A. R. Toft, “Preparation of Mirror Coatings for the Vacuum Ultraviolet in the 2-m Evaporator,” Appl. Opt. 8, 1183 1969.
7. J. F. Osantowski, “Reflectance and Optical Constants for Cer-Vit from 250 to 1050 A,” J. Opt. Soc. Am. 64, 834 1974.