Chemical Vapor Deposition at Low Temperatures

Journal of the Electrochemical Society

Volumn 122, Issue 4, 1975, Pages 585-588

  Viguie J C ^a   Spitz, J ^a  

^a CEA GRENOBLE   (France)

Author keywords

aerosol; atomization; pulverization; pyrolysis; spray

Indexed keywords

EID: 84975395981     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2134266     Document Type: Article

References (9)

1. J.C. Withers and L.C. McCandless, in “Proceedings of the Second International Conference on Chemical Vapor Deposition,” J.C. Withers and J.M. Blocher, Jr., Editors, p. 393, The Electrochemical Society Softbound Symposium Series, Princeton, N.J. (1970).
2. O. V. Vorob'eva and T.F. Polurotova, Izv. Akad. Nauk SSSR Neorgan. Materialy, 7, 266 (1971).
3. O. V. Vorob'eva and E.S. Bessonova, Steklo i Keram., 21, 9 (1964).
4. R.R. Chamberlin and J.S. Skarman, Journal of the Electrochemical Society, 113, 86 (1966).
5. B. Franck and R. Groth, Thin Solid Films, 3, 35 (1969).
6. M.N. Topp and P. Eisenklam, Ultrasonics, 127, (1972).
7. D. Ensminger, “Ultrasonics, the Low and the High Intensities Applications,” pp. 467–471, Marcel Dekker, Inc., New York (1973).
8. J. Spitz and J.C. Viguié, French Pat. 2, 110, 622.
9. J.W. Gilliland and M.S. Hall, Electrochem. Technol., 5, 303 (1967).