Growth Characteristics of Rutile Film by Chemical Vapor Deposition

Journal of the Electrochemical Society

Volumn 117, Issue 10, 1970, Pages 1310-1314

  Ghoshtagore, R N ^a   Noreika, A J ^b  

^a Westinghouse Research Laboratories ^*

^b Westinghouse Research & Development Cent   (United States)

Author keywords

deposition; dielectric; epitaxy; film; growth; nucleation; orientation; rutile

Indexed keywords

EID: 84975349637     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2407298     Document Type: Article

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