The Characteristics of Growth of Films of Zirconium and Hafnium Oxides (ZrO2/HfO2) by Thermal Decomposition of Zirconium and Hafnium β-Diketonate Complexes in the Presence and Absence of Oxygen

Journal of the Electrochemical Society

Volumn 126, Issue 7, 1979, Pages 1203-1207

  Balog, M ^a   Schieber, M ^a   Michman, M ^a   Patai, S ^a  

^a HEBREW UNIVERSITY OF JERUSALEM   (Israel)

Author keywords

oxygen effect; thin films; trifluoroacetylacetonate

Indexed keywords

EID: 84975341279     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2129243     Document Type: Article

References (9)

1. M. Balog, M. Schieber, M. Michman, and S. Patai, Thin Solid Films, 41, 247 (1977); M. Balog, M. Schieber, M. Michman, and S. Patai, J. Cryst. Growth, 17, 298 (1977).
2. M. Balog, M. Schieber, M. Michman, and S. Patai, Thin Solid Films, 47, 109 (1977).
3. M. Balog, M. Schieber, M. Michman, and S. Patai, To be published.
4. B.E. Deal, M. Sklar, A.S. Grove, and E.H. Snow, Journal of the Electrochemical Society, 114, 266 (1967).
5. J.A. Aboaf, Journal of the Electrochemical Society 114, 948 (1967).
6. S. Packswer and P. Skoug, in “Chemical Vapor Deposition,” J.M. Blocher and J.C. Withers, Editors, p. 619, The Electrochemical Society Soft-bound Proceedings Series, New York, N.Y. (1970).
7. J. Sladek, Journal of the Electrochemical Society, 118, 654 (1971).
8. R.C. Garvie, in “High Temperature Oxides,” A.M. Alper, Editor, p. 118, Academic Press, New York (1970); C.T. Lynch, Journal of the Electrochemical Society p. 193.
9. D.C. Bradley and P. Thornton, in “Comprehensive Inorganic Chemistry,” Vol. 3, J.C. Bailer, Jr. H.J. Emeleus, R. Nyholm, and H.F. Trotman-Dickenson, Editors, p. 419, Pergamon Press, Inc. Elmsford, N.Y. (1973).