Modeling truncated pixel values of faint reflections in MicroED images

Journal of Applied Crystallography

Volumn 49, Issue , 2016, Pages 1029-1034

  Hattne, Johan ^a   Shi, Dan ^a   De La Cruz, M Jason ^a   Reyes, Francis E ^a   Gonen, Tamir ^a  

^a HOWARD HUGHES MEDICAL INSTITUTE   (United States)

Author keywords

CryoEM; Micro electron diffraction; MicroED; X ray free electron lasers; XFELs

Indexed keywords

ELECTRON DIFFRACTION; ELECTRONS; FREE ELECTRON LASERS; SIGNAL TO NOISE RATIO; CRYSTALLOGRAPHY; PIXELS; X RAY LASERS;

CRYOEM; DIFFRACTION IMAGES; INTEGRATED INTENSITIES; MICROED; STRUCTURE FACTORS; THREE-PARAMETER LOGNORMAL DISTRIBUTION; X-RAY FREE ELECTRON LASERS; XFELS; SCATTERING ANGLES;

PIXELS; X RAY CRYSTALLOGRAPHY;

EID: 84973353644     PISSN: 00218898     EISSN: 16005767     Source Type: Journal    
DOI: 10.1107/S1600576716007196     Document Type: Article

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