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Volumn 19, Issue 8, 1994, Pages 63-67

Planarized Copper Multilevel Interconnections for VLSI Applications

(3)  Misawa, N a   Ohba, T a   Yagi, H a  

a NONE

Author keywords

[No Author keywords available]

Indexed keywords


EID: 84971945563     PISSN: 08837694     EISSN: 19381425     Source Type: Journal    
DOI: 10.1557/S088376940004776X     Document Type: Article
Times cited : (22)

References (14)
  • 6
    • 84971902051 scopus 로고
    • Abstracts on 21st SSDM, Tokyo, Japan, B-1-3
    • K. Ohno, M. Sato, and Y. Arita, Abstracts on 21st SSDM, Tokyo, Japan, B-1-3 (1989) p. 157.
    • (1989) , pp. 157
    • Ohno, K.1    Sato, M.2    Arita, Y.3
  • 7
  • 8
    • 0141689703 scopus 로고
    • For example, see, edited by W.S. Rana, R.V. Joshi, and I. Ohdomari (Mate-rials Research Society, Pittsburgh PA
    • For example, see R.V. Joshi et al., Advanced Metallization for ULSI Applications, edited by W.S. Rana, R.V. Joshi, and I. Ohdomari (Mate-rials Research Society, Pittsburgh PA, 1992) p. 35.
    • (1992) Advanced Metallization for ULSI Applications , pp. 35
    • Joshi, R.V.1
  • 10
    • 84971871871 scopus 로고
    • Paris, IV, C2-271
    • J.A.T. Norman et al., J. Phys. (Paris) IV, C2-271 (1991).
    • (1991) J. Phys.
    • Norman, J.A.T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.