Thin Film Processing of Complex Multilayer Structures of High-Temperature Superconductors

MRS Bulletin

Volumn 17, Issue 8, 1992, Pages 34-38

  Ono, Ronald H ^a  

^a NONE

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Indexed keywords

EID: 84971915373     PISSN: 08837694     EISSN: 19381425     Source Type: Journal    
DOI: 10.1557/S088376940004183X     Document Type: Article

References (12)

1. A comprehensive treatment of standard thin film etching is provided by Thin Film Processes II, edited by J.L Vossen and W. Kern (Academic Press, New York, 1991).
2. See especially D.B. Chrisey and A. Inam, MRS Bulletin XVII (2) (1992) p. 37.
3. K.P. Daly et al., Appl. Phys. Lett. 58, (1991) p. 634;
4. G. Koren, E. Aharoni, E. Polturak, and D. Cohen, Appl. Phys. Lett. 58 (1991) p. 634.
5. K. Char, M.S. Colclough, S.M. Garrison, N. Newman, and G. Zaharchuk, Appl. Phys. Lett. 59 (1992) p. 733;
6. S.J. Rosner, K. Char, and G. Zaharchuk, Appl. Phys. Lett. 60 (1992) p. 1010.
7. M.S. Dilorio, S. Yoshizumi, K.-Y. Yang, J. Zhang, and M. Maung, Appl. Phys. Lett. 58 (1991) p. 2552.
8. R.H. Ono, et al., Appl. Phys. Lett. 59 (1991) p. 1126.
9. L.P. Lee, K. Char, M.S. Colclough, and G. Zaharchuk, Appl. Phys. Lett. 59 (1992) p. 3051.
10. D.K. Fork, D.B. Fenner, R.W. Barton, J.M. Phillips, G.A.N. Connell, J.B. Boyce, and T.H. Geballe, Appl. Phys. Lett. 57 (1990) p. 1161.
11. T.E. Harvey, J. Moreland, B. Jeanneret, R.H. Ono, and D.A. Rudman, submitted to Appl. Phys. Lett. (1992).
12. S. Sivaram, H. Bath, R. Leggett, A. Maury, K. Monnig, and R. Tolles, Solid State Technology, May 1992, p. 87.