A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation

ACS Nano

Volumn 10, Issue 4, 2016, Pages 4451-4458

  Kim, Woo Hee ^a   Minaye Hashemi, Fatemeh Sadat ^a   Mackus, Adriaan J M ^a   Singh, Joseph ^b   Kim, Yeongin ^a   Bobb Semple, Dara ^a   Fan, Yin ^c   Kaufman Osborn, Tobin ^c   Godet, Ludovic ^c   Bent, Stacey F ^a  

^a Stanford University   (United States)

^b STANFORD UNIVERSITY   (United States)

^c APPLIED MATERIALS INC   (United States)

Author keywords

3D nanostructure; area selective deposition; atomic layer deposition; geometric selectivity; ion implantation

Indexed keywords

DEPOSITION; HYDROPHOBICITY; ION IMPLANTATION; IONS; METALS; NANOSTRUCTURES; PLATINUM; SURFACE CHEMISTRY;

3-D NANOSTRUCTURES; ANISOTROPIC DEPOSITION; AREA SELECTIVE; HYDROPHOBIC SURFACES; IMPLANTATION CONDITIONS; PATTERNED SUBSTRATES; SELECTIVE DEPOSITION; THREE-DIMENSIONAL (3D) NANOSTRUCTURES;

ATOMIC LAYER DEPOSITION;

EID: 84968813459     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/acsnano.6b00094     Document Type: Article

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