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Volumn 12, Issue 4, 1994, Pages 1020-1026

Low-Knudsen-number transport and deposition xGexlayers on Si substrates by rapid thermal chemical vapor deposition

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Indexed keywords


EID: 84967851748     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.579278     Document Type: Conference Paper
Times cited : (18)

References (30)
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    • inSilicon Processing for the VLSI Era (Lattice, Sunset Beach, CA
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    • (1986)
    • Wolf, S.1    Tauber, R.N.2
  • 2
    • 84967851542 scopus 로고
    • in Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ULSI Applications (Noyes, Park Ridge, NJ
    • J. E. J. Schmitz, in Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ULSI Applications (Noyes, Park Ridge, NJ, 1992).
    • (1992)
    • Schmitz, J.E.J.1
  • 12
    • 0141689703 scopus 로고
    • inAdvanced Metallization for ULSI Applications, edited by V. V. S. Rana, R. V. Joshi and I. Ohdomari (Materials Research Society, Pittsburgh, PA
    • J. J. Hsieh and R. V. Joshi, inAdvanced Metallization for ULSI Applications, edited by V. V. S. Rana, R. V. Joshi and I. Ohdomari (Materials Research Society, Pittsburgh, PA, 1992), p. 77.
    • (1992) , pp. 77
    • Hsieh, J.J.1    Joshi, R.V.2
  • 13
    • 84967848742 scopus 로고    scopus 로고
    • EVOLVE is a low-pressure deposition process simulator developed by, at ASU and Motorola, Inc. with funding from the Semiconductor Research Corporation and the National Science Foundation
    • EVOLVE is a low-pressure deposition process simulator developed by T. S. Cale at ASU and Motorola, Inc. with funding from the Semiconductor Research Corporation and the National Science Foundation.
    • Cale, T.S.1
  • 14
    • 84967851319 scopus 로고    scopus 로고
    • EVOLVE-3D is a three-dimensional low-pressure deposition process simulator developed by, at ASUunder the direction of, with funding from the Semiconductor Research Corporation and the National Science Foundation
    • EVOLVE-3D is a three-dimensional low-pressure deposition process simulator developed by H. Liao at ASUunder the direction of Dr. T. S. Cale with funding from the Semiconductor Research Corporation and the National Science Foundation.
    • Liao, H.1    Cale, T.S.2
  • 20
    • 0026945605 scopus 로고
    • Thin Solid Films
    • M. B. Chaara and T. S. Cale, Thin Solid Films 220, 19 (1992).
    • (1992) , vol.220 , pp. 19
    • Chaara, M.B.1    Cale, T.S.2
  • 23
    • 84967853867 scopus 로고
    • inPLTMG: A Software Package for Solving Elliptic Partial Differential Equations (Society for Industrial and Applied Mathematics, PA
    • R. E. Bank, inPLTMG: A Software Package for Solving Elliptic Partial Differential Equations (Society for Industrial and Applied Mathematics, PA 1990).
    • (1990)
    • Bank, R.E.1
  • 27
  • 28
    • 84967808125 scopus 로고
    • inThe Properties of Gases and Liquids (McGraw-Hill, New York
    • R. C. Reid, W. E. Stewart, and B. E. Poling, inThe Properties of Gases and Liquids (McGraw-Hill, New York, 1988).
    • (1988)
    • Reid, R.C.1    Stewart, W.E.2    Poling, B.E.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.