Etching of aluminum alloys in the transformer-coupled plasma etcher

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 12, Issue 4, 1994, Pages 1328-1333

  Yunju Ra, Y ^a   Bradley, Stephen G ^a   Chen, China Hwa ^a  

^a LAM RESEARCH CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84967850136     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.579316     Document Type: Conference Paper

References (14)

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