Effect of treatment temperature on surface wettability of methylcyclosiloxane layer formed by chemical vapor deposition

Applied Surface Science

Volumn 379, Issue , 2016, Pages 446-451

  Ishizaki, Takahiro ^a   Sasagawa, Keisuke ^a   Furukawa, Takuya ^a   Kumagai, Sou ^a   Yamamoto, Erina ^a   Chiba, Satoshi ^a   Kamiyama, Naosumi ^a   Kiguchi, Takayoshi ^a  

^a SHIBAURA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

1,3,5,7 Tetramethylcyclotetrasiloxane; Contact angle hysteresis; CVD; Hydrophobicity; Superhydrophobicity

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONTACT ANGLE; HYDROPHOBICITY; HYSTERESIS; MOLECULES; SILICON COMPOUNDS; WETTING;

1,3,5,7-TETRAMETHYLCYCLOTETRASILOXANE; CONTACT ANGLE HYSTERESIS; SUPER-HYDROPHOBIC SURFACES; SUPERHYDROPHOBICITY; SURFACE HYDROPHOBICITY; THERMOGRAVIMETRIC ANALYZERS; TREATMENT TEMPERATURE; WATER CONTACT ANGLE MEASUREMENT;

SURFACE ROUGHNESS;

EID: 84964600742     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2016.03.149     Document Type: Article

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