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Volumn 2, Issue , 2001, Pages 1334-1336

T-shape gate process & its application in HFET fabrication

Author keywords

[No Author keywords available]

Indexed keywords


EID: 84964474569     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSICT.2001.982148     Document Type: Conference Paper
Times cited : (1)

References (2)
  • 1
    • 0008604731 scopus 로고    scopus 로고
    • The University of Michigan June
    • DIMITRIS PAVLIDIS .The University of Michigan.COMPOUND SEMICONDUCTOR, June 1999,p.58
    • (1999) Compound Semiconductor , pp. 58
    • Pavlidis, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.