Microfabricated ion accelerator grid design issues: Electric breakdown characteristics of silicon dioxide insulator material

34th AIAA/ASME/SAE/ASEE Joint Propulsion Conference and Exhibit

Volumn , Issue , 1998, Pages

  Mueller, Juergen ^a,b   Pyle, David ^a,c   Chakraborty, Indrani ^a,d   Ruiz, Ronald ^a,e   Tang, William ^a,d   Lawton, Russell ^a,e  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b Advanced Propulsion Technology Group   (United States)

^c UNIVERSITY OF TEXAS   (United States)

^d Microdevices Laboratory   (United States)

^e Failure Analysis Group   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC BREAKDOWN; INSULATING MATERIALS; MICROFABRICATION; OXIDE FILMS; PROPULSION; SILICA; SILICON OXIDES; SUBSTRATES; SURFACE MORPHOLOGY; TEMPERATURE;

BREAKDOWN CHARACTERISTICS; BREAKDOWN STRENGTHS; CHEMICAL VAPOR DEPOSITED; INSULATOR MATERIALS; ION ACCELERATOR; LOW TEMPERATURES; SILICON OXIDE SURFACES; SURFACE BREAKDOWN;

MORPHOLOGY;

EID: 84963818056     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.2514/6.1998-3923     Document Type: Conference Paper

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