Self-limiting atomic layer deposition of conformal nanostructured silver films

Applied Surface Science

Volumn 364, Issue , 2016, Pages 789-797

  Golrokhi, Zahra ^a   Chalker, Sophia ^a   Sutcliffe, Christopher J ^a   Potter, Richard J ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

Author keywords

Atomic layer deposition; Nanoparticles; Self limiting; Silver; Thin films

Indexed keywords

ASPECT RATIO; ATOMS; CONFORMAL MAPPING; DEHYDROGENATION; DEPOSITION RATES; METAL NANOPARTICLES; METALLIC FILMS; NANOPARTICLES; PLASMONICS; QUARTZ CRYSTAL MICROBALANCES; SILVER; SILVER COMPOUNDS; SILVER NANOPARTICLES; SURFACE TOPOGRAPHY; TEMPERATURE; THIN FILMS; TOPOGRAPHY;

CATALYTIC DEHYDROGENATION; CONTROLLED DEPOSITION; EFFECTS OF TEMPERATURE; MASS DEPOSITION RATE; NANO-STRUCTURED SILVERS; SELF-LIMITING; SELF-LIMITING GROWTHS; SITU QUARTZ CRYSTAL MICROBALANCE;

ATOMIC LAYER DEPOSITION;

EID: 84963783932     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2015.12.127     Document Type: Article

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