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Proceedings of the IEEE 2002 International Interconnect Technology Conference, IITC 2002

Volumn , Issue , 2002, Pages 127-129

Electromigration induced incubation, drift and threshold in single-damascene copper interconnects

(2) Yokogawa, S a Takizawa, H b

a NEC CORPORATION (Japan)

b NONE

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CURRENT DENSITY; INTEGRATED CIRCUIT INTERCONNECTS;

COPPER INTERCONNECTS; KAWASAKI-HU TEST STRUCTURE; LIFETIME ESTIMATION; MEASURED RESULTS; OPERATING CONDITION; SINGLE DAMASCENE; TEMPERATURE RANGE; THRESHOLD PRODUCT;

ELECTROMIGRATION;

EID: 84961762797 PISSN: None EISSN: None Source Type: Conference Proceeding
DOI: 10.1109/IITC.2002.1014909 Document Type: Conference Paper

Times cited : (11)

References (11)

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