Development of DC-PFG for a large size ion beam in ion doping system

Proceedings of the International Conference on Ion Implantation Technology

Volumn 22-27-September-2002, Issue , 2002, Pages 311-314

  Maeno, Shuichi ^a   Ando, Yasunori ^a   Inouchi, Yutaka ^a   Tanaka, Hideki ^a   Naito, Masao ^a  

^a NISSIN ION EQUIPMENT CO LTD   (Japan)

Author keywords

Flat panel display (FPD); Ion bean; Ion doping; Ion implantation; Ion source; Thin film transistor (TFT)

Indexed keywords

ELECTRODES; ELECTRONS; FLAT PANEL DISPLAYS; GLASS; ION IMPLANTATION; ION SOURCES; PLASMA DISPLAY DEVICES; SEMICONDUCTOR DOPING; THIN FILM TRANSISTORS; THIN FILMS; WINDSHIELDS;

AXIAL MAGNETIC FIELD; ELECTROSTATIC PROBE; FLAT PANEL DISPLAYS (FPD); ION DOPING; ION-BEAM FORMATION; REAL TIME MEASUREMENTS; THIN-FILM ELECTRODE; TUNGSTEN FILAMENTS;

ION BEAMS;

EID: 84961366052     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IIT.2002.1258001     Document Type: Conference Paper

References (2)

1. S. Sakai, Y. Gotoh, H. Tsuji, Y.Toyota, J. Ishikawa, M. Tanjyo and K. Matsuda, "The charging mechanism of insurated electrode in negative-ion implantation," Nucl. Instr. and Meth. In Phys.Res. B 96 (1995) 43-47.
2. P. N. Guzdar, A. S. Sharma and S. K. Guharay, "Charging of substrates irradiated by particle beams," Appl. Phys.Lett. 71 (22), 1 Dec. 1997.