Anti-shrinkage coating approach as a solution provider to ArF resists

2002 International Microprocesses and Nanotechnology Conference, MNC 2002

Volumn , Issue , 2002, Pages 278-

  Lee, Si Hyeung ^a   Kim, Hyung Do ^a   Choi, Sang Jun ^a   Lee, Jung Hyeon ^a   Cho, Han Ku ^a   Han, Woo Sung ^a   Moon, Joo Tae ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COATINGS; CROSSLINKING; DEIONIZED WATER; NANOTECHNOLOGY;

193 NM RESIST; ANTI-SHRINKING; CRITICAL DIMENSION MEASUREMENT; CROSS-LINKERS; DEIONISED WATERS; PATTERN FIDELITY; SOLUTION PROVIDERS; WATERSOLUBLE POLYMERS;

SHRINKAGE;

EID: 84960398336     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2002.1178651     Document Type: Conference Paper

References (0)