Development of 3-D focused-ion-beam (FIB) etching methods for nano- and micro-technology application

2001 International Microprocesses and Nanotechnology Conference, MNC 2001

Volumn , Issue , 2001, Pages 34-35

  Kim, S J ^a   Yamashita, T ^a   Lee, K Y ^b   Nagao, M ^c   Sato, M ^c   Maeda, H ^c  

^a TOHOKU UNIVERSITY   (Japan)

^b Pukyong National University   (South Korea)

^c KITAMI INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL WHISKERS; ELECTRON TUNNELING; ETCHING; NANOSENSORS; NANOTECHNOLOGY; SINGLE CRYSTALS; TRANSIENTS;

BI-2201; EVAPORATION PROCESS; FIB ETCHING; FOCUSED ION BEAM ETCHING; IN-SITU ETCHING; MICRO TECHNOLOGY; SINGLE-ELECTRON TUNNELING;

ION BEAMS;

EID: 84960332880     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2001.984055     Document Type: Conference Paper

References (0)