P-type NiO thin films prepared by sputtering for detection of pollutants

Lecture Notes in Electrical Engineering

Volumn 268 LNEE, Issue , 2014, Pages 121-125

  Kumar, Raj ^a   Baratto, C ^a   Faglia, G ^a   Sberveglieri, G ^a   Bontempi, E ^a   Borgese, L ^a  

^a UNIVERSITY OF BRESCIA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; DEPOSITION; ETHANOL; GAS MIXTURES; MICROSYSTEMS; MIXTURES; NICKEL OXIDE; NITROGEN OXIDES; POLLUTION DETECTION; SCANNING ELECTRON MICROSCOPY; SENSORS; SURFACE MORPHOLOGY; X RAY DIFFRACTION;

DEPOSITION TEMPERATURES; DETECTION OF POLLUTANT; GAS SENSING PROPERTIES; GLANCING INCIDENCE X-RAY DIFFRACTIONS; OPERATING TEMPERATURE; POST DEPOSITION ANNEALING; RF REACTIVE MAGNETRON SPUTTERING; WORKING TEMPERATURES;

THIN FILMS;

EID: 84958536462     PISSN: 18761100     EISSN: 18761119     Source Type: Book Series    
DOI: 10.1007/978-3-319-00684-0_23     Document Type: Conference Paper

References (4)

1. A. Wisitsoraat, A. Tuantranont, E. Comini, G. Sberveglieri, W. Wlodarski, Characterization of n-type and p-type semiconductor gas sensors based on NiO x doped TiO 2 thin films. Thin Solid Films 517 , 2775-2780 (2009)
2. I. Hotovy, J. Huran, L. Spiess, H. Romanus, S. Caponez, V. Rehacek, A. M. Taurino, D. Donoval, and P. Siciliano, Au-NiO nanocrystalline thin films for sensor application. Journal of Physics: Conference Series 61 , 435-439 (2007)
3. P. Colombi, P. Zanola, E. Bontempi, R. Roberti, M. Gelfi , E. L. Depero, Journal of Applied Crystallography 39 , 176-179 (2006)
4. I. Hotovy, J. Huran, L. Spiess, R. Capkovic, S. Hascik, Preparation and characterization of NiO thin films for gas sensor application. Vacuum 58 , 300-307 (2000)