Poly (Fluoro Methacrylate) as Highly Sensitive, High Contrast Positive Resist

Journal of the Electrochemical Society

Volumn 124, Issue 10, 1977, Pages 1648-1651

  Kakuchi, Masami ^a   Sugawara, Shungo ^a   Murase, Kei ^a   Matsuyama, Kentaro ^a  

^a NTT CORPORATION   (Japan)

Author keywords

polymer resist; positive resist; x ray lithography

Indexed keywords

EID: 84957494094     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2133127     Document Type: Article

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