Photoablation Of Resist Coated Alignment Targets To Improve VLSI Pattern Overlay

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 774, Issue , 1987, Pages 172-180

  Polasko, Kenneth J ^b   Balch, Ernest W ^b  

^a LEITZ 1 MAGE MICRO SYSTEMS   (United States)

^b GE GLOBAL RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84957478634     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.940403     Document Type: Conference Paper

References (8)

1. W.G. Oldham, “The Use of Contrast Enhancement Layers to Improve the Effective Contrast of Positive Photoresist ”, IEEE Trans. on Electron Devices, Vol. ED - 34, No. 2, 1987, pp. 247-251
2. B. Lin, Y. Taur, K. Petrillo, C. Lapadula, And J. Wilczynski, “High Performance Single Layer Resist Systems for 1-um CMOS Fabrication Using An Optical Stepper ”, Microcircuit Engineering, 1985, pp. 31-43.
3. H. Egger, H. Pummer, and C.K. Rhodes, “Excimer Lasers for the Generation of Extreme Ultraviolet Radiation ”, Laser Focus, June, 1982.
4. R. Srinivasan and Bodil Braren, “Ablative Photodecomposition of Polymer Films by Pulsed FAR-Ultraviolet (193nm) Laser Radiation; Dependence of Etch Depth on Experimental Conditions ”, Journal of Polymer Science: Polymer Chemistry Edition, Vol. 22, 2601-2609 (1984), John Wiley & Sons, Inc.
5. B. Garrison, R. Srinivasan, “Laser Ablation of Organic Polymers: Microscopic Models for Photochemical and Thermal Processes,” J. Appl. Phys. 57 (8), 15 April 1985.
6. R. Srinivasan, “Action of FAR-Ultraviolet Light on Organic Polymer Films: Applications to Semiconductor Technology,” IBM T.J. Watson Research Center, Yorktown Heights, NY.
7. C.H. Stapper, “Modeling of Integrated Circuit Defect Sensitivities ”, IBM J. Res. Develop. 27(6), 1983, pp. 549-556.
8. H.J.F. Peuscher and D.J.L. Beem, “Yield Analysis and Improvement of CCD Devices ”, Solid State Technology, Feb. 1986, pp. 111-115.