An Application of Interference Microscopy to Integrated Circuit Inspection and Metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 775, Issue , 1987, Pages 233-249

  Davidson, Mark ^a   Kaufman, Kalman ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; IMAGE RECORDING; INSPECTION; INTEGRATED CIRCUITS; MICROSCOPES; PIXELS; PROBES; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; SINGLE CRYSTALS; TIMING CIRCUITS;

CONFOCAL LASER SCANNING MICROSCOPE; INTEGRATED CIRCUIT INSPECTION; INTERFERENCE MICROSCOPES; INTERFERENCE MICROSCOPY; LINEWIDTH MEASUREMENTS; RESOLUTION IMPROVEMENT; SINGLE CRYSTAL SILICON; THREE DIMENSIONAL IMAGES;

PROCESS CONTROL;

EID: 84957477993     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.940433     Document Type: Conference Paper

References (5)

1. Steel, W. H., Interferometry, second edition, (Cambridge University Press, Cambridge, 1983).
2. Born, M., and Wolf, E., Principles of Optics, sixth edition (Pergamon, Oxford, 1980).
3. Lipson, S. G., and Lipson, H., Optical Physics, second edition, (Cambridge University Press, Cambridge, 1981).
4. Wilson, T., and Sheppard, C., Theory and Practice of Scanning Optical Microscopy, (Academic Press, London, 1984).
5. Nyyssonen, D., “Theory of Optical Edge Detection and Imaging of Thick Layers,” Journal of the Optical Society of America, Vol. 72, page 1425, October 1982.