Monte Carlo simulation of the thermalization of sputtered atoms and reflected atoms in the magnetron sputtering discharge

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 13, Issue 1, 1995, Pages 101-112

  Lshida, M ^b  

^a OKAYAMA UNIVERSITY OF SCIENCE   (Japan)

^b MITSUBISHI CHEMICAL CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84957230217     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.579874     Document Type: Article

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