Mid-UV photoresists combining chemical amplification and dissolution inhibition

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 920, Issue , 1988, Pages 42-50

  O’Brien, Michael J ^a   Crivello, James V ^a  

^a GE GLOBAL RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IRRADIATION; PHENOLIC RESINS; PHOTORESISTS;

ACID-LABILE; BRONSTED ACIDS; CHEMICAL AMPLIFICATION; NOVOLAC RESIN; ONIUM SALTS; PHOTOPRODUCTS; UV IRRADIATION; UV PHOTORESIST;

DISSOLUTION;

EID: 84957144611     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.968300     Document Type: Conference Paper

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