Epitaxial growth of nickel silicide NiSi2 on silicon

Japanese Journal of Applied Physics

Volumn 13, Issue , 1974, Pages 669-672

  Tu, King Ning ^a   Alessandrini, Eileen I ^a   Chu, Wei Ken ^a   Krautle, Hubert ^a   Mayer, James W ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84957133304     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAPS.2S1.669     Document Type: Article

References (10)

1. J. W. Mayer and K. N. Tu: J. Vac. Sci and Tech. 11 (1974) 86.
2. H. Muta and D. Shinoda: J. Appl. Phys. 43 (1973) 2913.
3. R. W. Bower, R. E. Scott, and D. Sigurd: Solid State Elect. 16 (1973) 1461.
4. G. A. Hutchins and A. Shepala: Thin Solid Films 18 (1973) 343.
5. K. E. Sundstrom, S. Petersson, and P. -A. Tove: Uppsala University Report, UPTEC F3-29R (to be published).
6. W. D. Buckley and S. C. Moss: Solid State Elect. 15 (1972) 1331.
7. M. Hansen: Constitution of Binary Alloys (McGraw-Hill, New York, 1958).
8. W. K. Chu, J. W. Mayer, M. -A. Nicolet, T. M. Buck, G. Amsel, and F. H. Eisen: Thin Solid Films 17 (1973) 1.
9. K. N. Tu and B. S. Berry: J. Appl. Phys. 43 (1972) 3283.
10. D. Sigurd, W. Van der Weg, R. Bower, and J. W. Mayer: Thin Solid Films 19 (1974) 319.