Transmission electron microscopy studies of brown and golden titanium nitride thin films as diffusion barriers in very large scale integrated circuits

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 6, Issue 3, 1988, Pages 1602-1608

  Kumar, N ^a   Mcginn, J T ^b   Pourrezaei, K ^a   Lee, B ^c   Douglas, E C ^c  

^a DREXEL UNIVERSITY   (United States)

^b SARNOFF CORPORATION   (United States)

^c Microelectronics Center ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84956039609     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.575335     Document Type: Article

References (36)

1. N. W. Cheung, H. von Seefeld, and M.-A. Nicolet, J. Appl. Phys. 52, 4297 (1981).
2. C. Y. Ting, J. Vac. Sci. Technol. 21, 14 (1982).
3. M. Finetti, I. Suni, and M.-A. Nicolet, J. Electron. Mater. 13, 327 (1984).
4. M. Wittmer and H. Melchoir, Thin Solid Films 93, 397 (1982).
5. H. Norstrom, S. Nygren. P. Wiklund, M. Ostling, R. Buchta, and C. S. Petersson, Vacuum 35. 547 (1985).
6. N. Kumar, M. G. Fissel, K. Pourrezaei, B. Lee, and E. C. Douglas, Thin Solid Films 153. 287 (1987).
7. S. Kanamori, Thin Solid Films 136, 195 (1986).
8. H. P. Kattelus, J. L. Tandon, C. Sala, and M.-A. Nicolet, J. Vac. Sci. Technol. A4, 1850 (1986).
9. W. Sinke, G. P. A. Frijlink, and F. W. Saris, Appl. Phys. Lett. 47. 471 (1985).
10. J. B. Stimmell and B. N. Mehrotra, in Proceedings of 1987 Tungsten Conference Yorktown Heights, NY (preprint to be published).
11. B. Lee and E. C. Douglas, K. Pourrezaei, and N. Kumar, in Proceedings of the 4th International IEEE VLSI Multilevel Interconnection Conference, Santa Clara, CA, 1987, p. 344.
12. N. Kumar, K. Pourrezaei, B. Lee, and E. C. Douglas, Thin Solid Films (submitted).
13. I. Suni, M. Maenpaa, M. A. Nicolet, and M. Luomajarvi, J. Electrochem. Soc. 130. 1215 (1983).
14. B. E. Jacobson, R. Nimmagadda, and R. F. Bunshah, Thin Solid Films 63, 333 (1979).
15. M. K. Hibbs, J.-E. Sundgren, B. E. Jacobson, and B.-O. Johansson, Thin Solid Films 107, 149 (1983).
16. U. Helmersson, J.-E. Sundgren, and J. E. Greene, J. Vac. Sci. Technol. A4, 500(1986).
17. M. K. Hibbs, B.-O. Johansson, J.-E. Sundgren, and U. Helmersson, Thin Solid Films 122, 115 (1984).
18. J.-E. Sundgren, Thin Solid Films 128, 21 (1985).
19. A. Armigliato, M. Finetti, S. Guerri, P. Ostoja, A. Scorzoni, and J. Garrido, Thin Solid Films 140, 173 (1986).
20. N. Kumar, K. Pourrezaei, R. J. DeMaria, and B. Singh, MRS Symp. Proc. 68, 357 (1986).
21. N. Kumar, K. Pourrezaei, M. Fissel, T. Begley, B. Lee, and E. C. Douglas, J. Vac. Sci. Technol. A5, 1778 (1987).
22. M. S. Abrahams and C. J. Buiocchi, J. Appl. Phys. 45, 3315 (1974).
23. J. C. Bravman and R. Sinclair, J. Electron Microsc. Techniques 1, 53 (1984).
24. D. M. Mattox and G. J. Kominiak, J. Vac. Sci. Technol 9, 528 (1972).
25. D. S. Williams, F. A. Baiocchi, R. C. Beairsto, J. M. Brown, R. V. Knoell, and S. P. Murarka (preprint).
26. A. G. Blachman, Metall. Trans. 2, 699 (1971).
27. R. D. Bland, G. J. Kominiak, and D. M. Mattox, J. Vac. Sci. Technol. 11, 671 (1974).
28. D. W. Hoffman and J. A. Thornton, J. Vac. Sci. Technol. 17, 380 (1980).
29. D. W. Hoffman and J. A. Thornton, Thin Solid Films 45, 387 (1977).
30. J. A. Thornton and D. W. Hoffman, J. Vac. Sci. Technol. A3, 576 (1985).
31. J.-E. Sundgren, B.-O. Johansson, H. T. G. Hentzell, and S.-E. Karlsson, Thin Solid Films 105, 385 (1983).
32. Y. Igasaki and H. Mitsuhashi, Thin Solid Films 70, 17 (1980).
33. J. M. Poitevin, G. Lemperiere, and J. Tardy, Thin Solid Films 97, 69 (1982).
34. J. A. Thornton, Annu. Rev. Mater. Sci. 7, 239 (1977).
35. L. T. Lamont, Jr. and A. Lang, J. Vac. Sci. Technol. 7, 198 (1970).
36. B. A. Movchan and A. V. Demchishin, Phys. Met. Metallogr. 28, 83 (1969).