Deposition of Cu film on SiO2 using a partially ionized beam

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 8, Issue 3, 1990, Pages 1465-1469

  Lau, L W M ^b   Yang, G R ^a   Lu, T M ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b UNIVERSITY OF WESTERN ONTARIO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84955044332     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.576858     Document Type: Article

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