Amorphous Ta Si-N thin-film alloys as diffusion barrier in Al/Si metallizations

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 8, Issue 3, 1990, Pages 3006-3010

  Molarius, J M ^b   Nieh, C W ^a   Nicolet, M A ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^b AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84955039864     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.576620     Document Type: Article

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