Preparation of cubic boron nitride films by radio frequency bias sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 13, Issue 6, 1995, Pages 2843-2847

  Tsuda, Osamu ^a   Yamada, Yukiko ^a   Fujii, Tsuyoshi ^a   Yoshida, Toyonobu ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84955030294     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.579715     Document Type: Article

References (25)

1. F. P. Bundy and R. H. Wentorf, Jr., J. Chem. Phys. 38, 1144 (1963).
2. K. Inagawa, K. Watanabe, H. Ohsone, K. Saitoh, and A. Itoh, J. Vac. Sci. Technol. A 5, 1696 (1987).
3. M. Murakawa and S. Watanabe, Surf. Coat. Technol. 43-44, 128 (1990).
4. T. Ikeda, Y. Kawata, and Y. Hirai, J. Vac. Sci. Technol. A 8, 3168 (1990).
5. T. Wada and N. Yamashita, J. Vac. Sci. Technol. A 10, 515 (1992).
6. N. Tanabe and T. Hayashi, Diamond Relat. Mater. 1, 151 (1992).
7. A. Chayahara, H. Yokoyama, T. Imura, and Y. Osaka, Jpn. J. Appl. Phys. 26 L1435 (1987).
8. T. Ichiki and T. Yoshida, Appl. Phys. Lett. 64, 851 (1994).
9. A. Weber, U. Bringmann, R. Nikulski, and C.-P. Klages, Proceedings of the 10th International Symposium on Plasma Chemistry, 1993 (unpublished), p. 1041.
10. M. Mieno and T. Yoshida, Jpn. J. Appl. Phys.,29 L1175 (1990).
11. K. Bewilogua, J. Buth, H. Hubsh, and M. Grishke, Diamond Relat. Mater. 2, 1206 (1993).
12. J. S. Logan, J. H. Keller, and R. G. Simmons, J. Vac. Sci. Technol. 14, 92 (1977).
13. O. Tsuda, J. Fujikata, Y. Yamada, and T. Yoshida, Advance in New Diamond Science and Technology, edited by S. Saito, N. Fujimori, O. Fukunaga, M. Kamo, K. Kobashi, and M. Yoshikawa (MYU, Tokyo, 1994), p. 595.
14. B. Window and N. Savvides, J. Vac. Sci. Technol. A 4, 453 (1986).
15. D. J. Kester, K. S. Ailey, and R. F. Davis, J. Mater. Res. 8, 1213 (1993).
16. D. L. Medlin, T. A. Friedman, P. B. Mirkarimi, P. Rez, M. J. Mills, and K. F. McCarty, J. Appl. Phys. 76, 295 (1994).
17. T. A. Friedman et. al., J. Appl. Phys. 76, 3088 (1994).
18. R. Geick, C. H. Perry, and G. Rupprecht, Phys. Rev. 146, 543 (1966).
19. P. J. Gielissem, S. S. Mitra, J. N. Plendl, R. D. Griffis, L. C. Mansur, R. Marshall, and E. A. Pascoe, Phys. Rev. 155, 1039 (1967).
20. A. Lehmann, L. Schumann, and K. Hubner, Phys. Status Solidi B 121, 505 (1984).
21. T. Ichiki and T. Yoshida, J. Appl. Phys. 75, 1330 (1994).
22. H. Yokoyama, M. Okamoto, and Y. Osaka, Jpn. J. Appl. Phys. 30, 344 (1991).
23. M. Mieno and T. Yoshida, Proceedings of the 11th International Conference on Vacuum Materials, Juan-les-Pins, Cap d’Antibes, France, 1992 (unpublished), p. 337;
24. T. Yoshida, M. Mieno, and J. Fujikata, Electrochemical Processing Tailored Materials, edited by R. C. Alkire, N. Masuko, Y. Ito, D. R. Sadoway, and D. J. Economou [Proc. Electrochem. Soc. 93, 12, 216 (1993)].
25. D. J. Kester and R. Messier, J. Appl. Phys. 72, 504 (1992).