Surfactant-free hydrothermal synthesis and gas-sensing properties of NaBi(MoO4)2 nanocrystals

Materials Letters

Volumn 168, Issue , 2016, Pages 72-75

  Lin, Zhidong ^a   Xu, Mengying ^a   Hong, Yuyuan ^a   Wang, Xuehua ^a   Fu, Ping ^a  

^a WUHAN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

Gas sensing; NaBi(MoO4)2; Nanocrystalline materials; Sensors

Indexed keywords

ACETONE; CHEMICAL DETECTION; CHEMICAL SENSORS; GAS DETECTORS; GASES; NANOCRYSTALLINE MATERIALS; NANOCRYSTALS; SENSORS;

CRYSTALLINE SIZE; GAS SENSING; GAS SENSING MATERIAL; GAS SENSING PROPERTIES; HYDROTHERMAL TREATMENTS; NABI(MOO4)2; SENSING PROPERTY; WORKING TEMPERATURES;

HYDROTHERMAL SYNTHESIS;

EID: 84954318212     PISSN: 0167577X     EISSN: 18734979     Source Type: Journal    
DOI: 10.1016/j.matlet.2016.01.038     Document Type: Article

References (23)

1. L. Luo, Q. Jiang, G. Qin, K. Zhao, G. Du, H. Wang, and et al. Sens. Actuators B 218 2015 205 214
2. H. Kim, and J. Lee Sens. Actuators B 192 2014 607 627
3. X. Zhou, X. Li, H. Sun, P. Sun, X. Liang, F. Liu, and et al. ACS Appl. Mater. Interfaces 79 2015 15414 15421
4. Y. Wang, B. Liu, S. Xiao, H. Li, L. Wang, D. Cai, and et al. J. Mater. Chem. A 3 2015 1317 1324
5. C. Gu, X. Xu, J. Huang, W. Wang, Y. Sun, and J. Liu Sens. Actuators B 174 2012 31 38
6. X. Li, X. Zhou, H. Guo, C. Wang, J. Liu, P. Sun, and et al. ACS Appl. Mater. Interfaces 6 2014 18661 18667
7. L. Rwnard, O. Babot, H. Saadaoui, H. Fuess, J. Brota, A. Gurlo, and et al. Nanoscale 4 2012 6806 6813
8. M. Punginsang, A. Wisitsoraat, A. Tuantranont, S. Phanichphant, and C. Liewhiran Sens. Actuators B 210 2015 589 601
9. S. Ahmad, B. Jousseaume, L. Servant, T. Toupance, and C. Zakri Chem. Commun. 47 2011 5001 5003
10. X. Sun, H. Hao, H. Ji, X. Li, S. Cai, and C. Zheng ACS Appl. Mater. Interfaces 6 2014 401 409
11. L. Wang, A. Teleki, S. Pratsinis, and P. Gouma Chem. Mater. 20 2008 4794 4796
12. Z. Dou, C. Cao, Y. Chen, and W. Song Chem. Commun. 50 2014 14889 14891
13. Y. Liu, W. Zhan, Y. He, Y. Wang, X. Kong, Q. Kuang, and et al. ACS Appl. Mater. Interfaces 6 2014 4186 4195
14. P. Rai, J. Yoon, H. Jeong, S. Hwang, C. Kwak, and J. Lee Nanoscale 6 2014 8992 8999
15. Z. Lou, J. Deng, L. Wang, L. Wang, and T. Zhang Sens. Actuators B 182 2013 217 222
16. M.T. Le., M. Kovanda, V. Myslik, M. Vrnata, I.V. Driessche, and S. Hoste Thin Solid Films 497 2006 284 291
17. J. Liu, R. Wei, J. Hu, L. Li, and J. Li J. Alloy. Comp. 580 2013 475 480
18. L.S. Cavalcante, V.M. Longo, J.C. Sczancoski, M.A.P. Almeida, A.A. Batista, J.A. Varela, and et al. CrystEngComm 14 2012 853 868
19. A. Kudo, and Y. Miseki Chem. Soc. Rev. 38 2009 253 278
20. C. Goia, E. Matijevic, and D.V. Goia J. Mater. Res. 20 2005 1507 1514
21. W. Wei, J. Gao, Z. Jiang, X. Lu, and J. Xie Ceram. Int. 41 2015 11471 11481
22. X. Zhou, J. Liu, C. Wang, P. Sun, X. Hu, X. Li, and et al. Sens. Actuators B 206 2015 577 583
23. X. Zhou, W. Feng, C. Wang, X. Hu, X. Li, P. Sun, and et al. J. Mater. Chem. A 2 2014 17683 17690