Traceable emissivity measurements in RTP using room temperature reflectometry

11th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2003

Volumn , Issue , 2003, Pages 85-88

  Hunter, A ^a   Adams, B ^a   Ramanujam, R ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HEAT TREATMENT; RAPID THERMAL PROCESSING; REFLECTION; REFLECTOMETERS;

EMITTANCE MEASUREMENT; EMITTANCE STANDARDS; REFLECTOMETRY;

IN SITU PROCESSING;

EID: 84954163445     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RTP.2003.1249127     Document Type: Conference Paper

References (2)

1. DeWitt, D.P., Nutter, Gene, D.; Theory and Practice of Radiation Thermometry; pp. 64-68
2. Sato, Tsutomu; Spectral Emissivity of Silicon, Japanese Journal of Applied Physics, Vol. 6, No.3