The microstructure of suputter-deposited coatings

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 4, Issue 6, 1986, Pages 3059-3065

  Thornton, John A ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84953682805     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.573628     Document Type: Article

References (73)

1. J. H. Brophy, R. M. Rose, and J. Wulff, The Structure and Properties of Materials, Vol. 2. Thermodynamics of Structure (Wiley, New York, 1964), p. 82.
2. B. A. Movchan and A. V. Demchishin, Phys. Met. Metallogr. 28, 83 (1969).
3. J. A. Thornton, J. Vac. Sci. Technol. 11, 666 (1974).
4. J. A. Thornton and A. S. Benfold, in Thin Film Processes, edited by J. L. Vossen and W. Kern (Academic, New York, 1978), p. 75.
5. J. A. Thornton, Annu. Rev. Mater. Sci. 7, 239 (1977).
6. S. Craig and G. L. Harding, J. Vac. Sci. Technol. 19, 205 (1981).
7. M. J. Witcomb, Thin Solid Films 74, 223 (1980).
8. R. Messier, S. V. Krishnaswamy, L. R. Gilbert, and P. Swab, J. Appl. Phys. 51, 1611 (1980).
9. R. C. Ross and R. Messier, J. Appl. Phys. 52, 5329 (1981).
10. P. Swab, S. V. Krishnaswamy, and R. Messier, J. Vac. Sci. Technol. 17, 362 (1980).
11. U. Helmersson, J.-E. Sundgren, and J. E. Greene, J. Vac. Sci. Technol. A 4, 500(1986).
12. K. H. Guenther, Thin Solid Films 77, 239 (1981).
13. T. Spalvins and W. A. Brainird, J. Vac. Sci. Technol. 11, 1186 (1974).
14. J. W. Patten, Thin Solid Films 63, 121 (1979).
15. J. W. Patten, Thin Solid Films 75, 205 (1981).
16. J. Waterbeemd and G. W. Van Oosterhout, Philips Res. Rep. 22, 375 (1967).
17. J. A. Venables and G. L. Price, in Epitaxial Growth, edited by J. W. Matthews (Academic, New York, 1975), Part B, p. 381.
18. H. J. Leamy and A. G. Dirks, J. Appl. Phys. 49, 3430 (1978).
19. J. A. Thornton, J. Vac. Sci. Technol. 12, 830 (1975).
20. J. W. Patten, E. D. McClanahan, and J. W. Johnson, J. Appl. Phys. 42, 4371 (1971).
21. S. D. Dahlgren, J. Vac. Sci. Technol. 11, 832 (1974).
22. D. Henderson, M. H. Brodsky, and P. Chaudhari, Appl. Phys. Lett. 25, 641 (1974).
23. A. G. Dirks and H. J. Leamy, Thin Solid Films 47, 219 (1977).
24. H. Fritzche, M. Tanielian, C.C. Tsai, and J. Gaczi, J. Appl. Phys. 50, 3366 (1979).
25. S. Kim and D. J. Henderson, Thin Solid Films47, 155 (1977).
26. R. C. Ross and R. Messier, J. Appl. Phys. 52, 5329 (1981).
27. R. Messier and R. C. Ross, J. Appl. Phys. 53, 6220 (1982).
28. R. C. Ross and R. Messier, J. Appl. Phys. 54, 5744 (1983).
29. R. C. Ross and R. Messier, J. Appl Phys. 56, 347 (1984).
30. J. E. Yehoda and R. Messier, Appl. Surf. Sci. 22-23, 590 (1985).
31. R. Messier, Pennsylvania State University (private communication, June 1985).
32. R. Messier, J. Vac. Sci. Technol. A 4, 490 (1986).
33. T. A. Witten and L. M. Sander, Phys. Rev. Lett. 47, 1400 (1981).
34. P. Meakin, CRC Crit. Rev. Solid State Mater. Sci. (to be published).
35. R. Orbach, Science 231, 814 (1986).
36. P. Ramanlal and L. M. Sander, Phys. Rev. Lett. 54, 1828 (1985).
37. P. Meakin, Phys. Rev. B 28, 5221 (1983).
38. R. C. Ball and T. A. Witten, Phys. Rev. A 29, 2966 (1984).
39. P. Meakin, E. I. du Pont de Nemours and Company (private communication, February 1986).
40. S. D. Dahlgren, W. L. Nickolson, M. D. Merz, W. Bollmann, J. F. Devlin, and R. Wang, Thin Solid Films 40, 435 (1977).
41. H. T. G. Hentzell, C. R. M. Grovenor, and D. A. Smith, J. Vac. Sci. Technol. A 2, 218 (1984).
42. J. R. Lloyd, and S. Nakahara, J. Vac. Sci Technol. 14, 655 (1977).
43. A. Staudinger, and S. Nakahara, Thin Solid Films 45, 125 (1977).
44. S. Nakahara, Thin Solid Films 45, 421 (1977).
45. F. M. Fabis, Thin Solid Films 128, 57 (1985).
46. J. C. Knights, in Topics In Applied Physics, edited by J. D. Joannopoulos and G. Lucovsky (Springer, New York, 1984), Vol. 55, p. 5.
47. D. M. Mattox, and G. J. Kominiak, J. Vac. Sci. Technol. 9, 528 (1972).
48. R. D. Bland, G. J. Kominiak, and D. M. Mattox, J. Vac. Sci. Technol. 11, 671 (1974).
49. D. M. Mattox, and G. J. Kominiak, J. Electrochem. Soc. 120, 1535 (1973).
50. E. Kay, and G. Heim, J. Vac. Sci. Technol. 15, 288 (1978).
51. P. Ziemann, and E. Kay, J. Vac. Sci. Technol. A 1, 512 (1983).
52. J. M. E. Harper, J. J. Cuomo, and R. J. Gambino, in Ion Bombardment Modification of Surfaces-. Fundamentals and Applications, edited by O. Aucielloand R. Kelly (Elsevier, Amsterdam, 1984).
53. J. A. Thornton, Thin Solid Films 40, 335 (1977).
54. G. K. Wehner, and G. S. Anderson, in Handbook of Thin Films, edited by L. I. Maissel and R. Glang (McGraw-Hill, New York, 1970), p. 1-3.
55. H. D. Hadstrum, in Inelastic Ion Surface Collisions, edited by N. H. Tolk, J. C. Tully, W. Heiland, and C. W. White (Academic, New York, 1977), p. 1.
56. D. W. Hoffman, and J. A. Thornton, Thin Solid Films 40, 355 (1977).
57. J. A. Thornton and D. W. Hoffman, J. Vac. Sci. Technol. 14, 164 (1977).
58. D. W. Hoffman, and J. A. Thornton, Thin Solid Films 45, 387 (1977).
59. D. W. Hoffman, and J. A. Thornton, J. Vac. Sci. Technol. 16, 134 (1977).
60. J. A. Thornton, J. Tabock, and D. W. Hoffman, Thin Solid Films 64, 1141 (1979).
61. D. W. Hoffman, and J. A. Thornton, J. Vac. Sci. Technol. 17, 380 (1980).
62. J. A. Thornton, and D. W. Hoffman, J. Vac. Sci. Technol. 18, 203 (1981).
63. D. W. Hoffman, and J. A. Thornton, J. Vac. Sci. Technol. 20, 355 (1982).
64. J. A. Thornton, and D. W. Hoffman, J. Vac. Sci. Technol. A3, 576 (1985).
65. D. W. Hoffman, and M. R. Gaertner, J. Vac. Sci. Technol. 17, 425 (1980).
66. J. A. Thornton, in Deposition Technologies for Films and Coatings, edited by R. F. Bunshah etal. (Noyes, Park Ridge, NJ, 1982), p. 170.
67. R. Messier, A. P. Giri, and R. A. Roy, J. Vac. Sci. Technol. A 2, 500 (1984).
68. K. H. Müller, J. Appl. Phys. 58, 2573 (1985).
69. K. H. Müller, J. Vac. Sci. Technol. A4, 184 (1986).
70. J. A. Thornton, in Semiconductor Materials and Processing Technologies, edited by G. E. McGuire (Noyes, Park Ridge, NJ, 1986).
71. H. P. Bader, and M. A. Lardon, J. Vac. Sci. Technol. A 3, 2167 (1985).
72. Y. Homma and S. Tsunekawa, J. Electrochem. Soc. 132, 1466 (1985).
73. T. Mogami, M. Morimoto, H. Okabayashi, and E. Nagasawa, J. Vac. Sci. Technol. B 3, 857 (1985).