Process effects on radio frequency diode reactively sputtered ZrO2films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 8, Issue 6, 1990, Pages 3925-3928

  Yang, M M ^a   Reith, T M ^a   Lin, C J ^b  

^a IBM   (United States)

^b IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84953682099     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.576422     Document Type: Article

References (17)

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