Collimated magnetron sputter deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 9, Issue 2, 1991, Pages 261-265

  Rossnagel, S M ^a   Mikalsen, D ^a   Kinoshita, H ^b   Cuomo, J J ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84953679485     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.577531     Document Type: Article

References (3)

1. J.J. Cuomo and S.M. Rossnagel, J. Vac. Sci. Technol. A 4, 393 (1986).
2. J. J. Cuomo, H. R. Kaufman, and S. M. Rossnagel, US Patent No. 4, 588, 490, May 13, 1986.
3. D. J. Mikalsen and S. M. Rossnagel, US Patent No. 4, 824, 544, April 25, 1989.