Bending and turbulent enhancement phenomena of neutral gas flow containing an atmospheric pressure plasma by applying external electric fields measured by schlieren optical method

Japanese Journal of Applied Physics

Volumn 55, Issue 1, 2016, Pages

  Yamada, Hiromasa ^a,b   Yamagishi, Yusuke ^a,b   Sakakita, Hajime ^a,b   Tsunoda, Syuichiro ^a,b   Kasahara, Jiro ^c   Fujiwara, Masanori ^b   Kato, Susumu ^b   Itagaki, Hirotomo ^b   Kim, Jaeho ^b   Kiyama, Satoru ^b   Fujiwara, Yutaka ^a,b   Ikehara, Yuzuru ^b   Ikehara, Sanae ^b   Nakanishi, Hayao ^d   Shimizu, Nobuyuki ^e  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c NAGOYA UNIVERSITY   (Japan)

^d AICHI CANCER CENTER HOSPITAL   (Japan)

^e INTERNATIONAL UNIVERSITY OF HEALTH AND WELFARE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC MOVEMENTS; ATMOSPHERIC PRESSURE; ELECTRIC FIELD EFFECTS; ELECTRIC FIELD MEASUREMENT; ELECTRIC FIELDS; ELECTRODES; FLOW OF GASES; GASES; NOZZLES;

ATMOSPHERIC PRESSURE PLASMAS; DISCHARGE VOLTAGES; EXTERNAL ELECTRIC FIELD; MOMENTUM TRANSPORTS; NEUTRAL GAS FLOW; NEUTRAL PARTICLES; PLASMA EQUIPMENTS; SIMPLE MODELING;

ELECTRIC DISCHARGES;

EID: 84953211337     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAP.55.01AB08     Document Type: Conference Paper

References (37)

1. A. C. Gentile and M. J. Kushner, J. Appl. Phys. 78, 2074 (1995).
2. O. Eichwald, M. Yousfi, A. Hennad, and M. D. Benabdessadok, J. Appl. Phys. 82, 4781 (1997).
3. M. A. Malik, A. Ghaffar, and S. A. Malik, Plasma Sources Sci. Technol. 10, 82 (2001).
4. A. Starikovskiy and N. Aleksandrov, Prog. Energy Combust. Sci. 39, 61 (2013).
5. C. D. Cathey, T. Tang, T. Shiraishi, T. Urushihara, A. Kuthi, and M. A. Gundersen, IEEE Trans. Plasma Sci. 35, 1664 (2007).
6. S. B. Leonov, D. A. Yarantsev, A. P. Napartovich, and I. V. Kochetov, IEEE Trans. Plasma Sci. 34, 2514 (2006).
7. M. Laroussi, Plasma Processes Polym. 2, 391 (2005).
8. P. K. Chu, J. Y. Chen, L. P. Wang, and N. Huang, Mater. Sci. Eng. R 36, 143 (2002).
9. C. C. Wu, C. I. Wu, J. C. Sturm, and A. Kahn, Appl. Phys. Lett. 70, 1348 (1997).
10. S. Kanazawa, M. Kogoma, T. Moriwaki, and S. Okazaki, J. Phys. D 21, 838 (1988).
11. M. G. Kong, G. Kroesen, G. Morfill, T. Nosenko, T. Shimizu, J. van Dijk, and J. L. Zimmermann, New J. Phys. 11, 115012 (2009).
12. G. Fridman, G. Fridman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, and A. Fridman, Plasma Processes Polym. 5, 503 (2008).
13. S. U. Kalghatgi, G. Fridman, M. Cooper, G. Nagaraj, M. Peddinghaus, M. Balasubramanian, V. N. Vasilets, A. F. Gutsol, A. Fridman, and G. Friedman, IEEE Trans. Plasma Sci. 35, 1559 (2007).
14. D. Dobrynin, K. Wasko, G. Friedman, A. Fridman, and G. Fridman, Plasma Med. 1, 241 (2011).
15. A. Schutze, J. Y. Jeong, S. E. Babayan, J. Park, G. S. Selwyn, and R. F. Hicks, IEEE Trans. Plasma Sci. 26, 1685 (1998).
16. M. Laroussi and A. Tamer, Plasma Processes Polym. 4, 777 (2007).
17. H. W. Herrmann, I. Henins, J. Park, and G. S. Selwyn, Phys. Plasmas 6, 2284 (1999).
18. M. Teschke, J. Kedzierski, E. G. Finantu-Dinu, D. Korzec, and J. Engemann, IEEE Trans. Plasma Sci. 33, 310 (2005).
19. T. Shimizu, Y. Iwafuchi, G. E. Morfill, and T. Sato, New J. Phys. 13, 053025 (2011).
20. N. Jiang, J. L. Yang, F. He, and Z. Cao, J. Appl. Phys. 109, 093305 (2011).
21. J. W. Bradley, J. S. Oh, O. T. Olabanji, C. Hale, R. Mariani, and K. Kontis, IEEE Trans. Plasma Sci. 39, 2312 (2011).
22. S. Tsunoda, Master thesis, University of Tsukuba, Tsukuba (2012) [in Japanese].
23. M. Boselli, V. Colombo, E. Ghedini, M. Gherardi, R. Laurita, A. Liguori, P. Sanibondi, and A. Stancampiano, Plasma Chem. Plasma Process. 34, 853 (2014).
24. E. Karakas, M. Koklu, and M. Laroussi, J. Phys. D 43, 155202 (2010).
25. G. Arnoult, R. P. Cardoso, T. Belmonte, and G. Henrion, Appl. Phys. Lett. 93, 191507 (2008).
26. Q. Li, X. M. Zhu, J. T. Li, and Y. K. Pu, J. Appl. Phys. 107, 043304 (2010).
27. M. Ghasemi, P. Olszewski, J. W. Bradley, and J. L. Walsh, J. Phys. D 46, 052001 (2013).
28. E. Robert, V. Sarron, T. Darny, D. Ries, S. Dozias, J. Fontane, L. Joly, and J. M. Pouvesle, Plasma Sources Sci. Technol. 23, 012003 (2014).
29. L. Liu, Y. Zhang, and J. Ouyang, IEEE Trans. Plasma Sci. 42, 2494 (2014).
30. P. Olszewski, K. McKay, J. S. Oh, M. Ghasemi, E. Wagenaars, J. W. Bradley, and J. L. Walsh, Proc. 31st Int. Conf. Ionized Gases, 2013, p. 427.
31. P. Olszewski, E. Wagenaars, K. McKay, J. W. Bradley, and J. L. Walsh, Plasma Sources Sci. Technol. 23, 015010 (2014).
32. H. Sakakita, Y. Ikehara, and S. Kiyama, WO2012=005132 (2012).
33. G. S. Settles, Schlieren and Shadowgraph Techniques: Visualizing Phenomena in Transparent Media (Springer, Berlin, 2001) 1st ed., Chap. 2, p. 25.
34. Y. Yamagishi, Master Thesis, University of Tsukuba, Tsukuba (2015) [in Japanese].
35. J. P. Boeuf and L. C. Pitchford, J. Appl. Phys. 97, 103307 (2005).
36. G. V. Naidis, J. Phys. D 44, 215203 (2011).
37. M. McFarland, D. L. Albritton, F. C. Fehsenfeld, E. E. Ferguson, and A. L. Schmeltekopf, J. Chem. Phys. 59, 6610 (1973).