Strain relaxation mechanisms of thin deposited films

Critical Reviews in Solid State and Materials Sciences

Volumn 11, Issue 4, 1983, Pages 317-354

  Murakami, Masanori ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84953003107     PISSN: 10408436     EISSN: 15476561     Source Type: Journal    
DOI: 10.1080/10408438308244622     Document Type: Article

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