Investigation of the reaction of compound formation in the reactive evaporation process

Japanese Journal of Applied Physics

Volumn 13, Issue , 1974, Pages 467-470

  Itoh, Akio ^a   Misawa, Shunji ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84952297463     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.7567/JJAPS.2S1.467     Document Type: Article

References (8)

1. R. J. Miller and C. H. Bachman: J. appl. Phys. 29 (1958) 1277.
2. N. Schwartz: Trans. 10th Natl. Vacuum Symposium AVS (Macmillian Corp, New York, 1963) p. 235.
3. G. Hass: Vacuum 2 (1952) 331.
4. A. Itoh: Proc. 4th Intern. Vacuum Congr. (The Instit. of Phys. and the Physical Soc., London, 1968) Pt. 2, p. 536.
5. E. Ritter: J. Vacuum Sci. Technol. 3 (1966) 225.
6. L. I. Maissel and R. Glang: Handbook of Thin Film Technology (McGraw-Hill, New York, 1970) PI-80.
7. A. Itoh and H. Ishii: J. Vacuum Soc. Japan 7 (1964) 134 (in Japanese).
8. A. Itoh, S. Misawa, and H. Soejima: J. Vacuum Soc. Japan 13 (1970) 413 (in Japanese).