Ai dot hexagonal array formation using anodic oxidation and selective etching

Digest of Papers - 2000 International Microprocesses and Nanotechnology Conference, MNC 2000

Volumn , Issue , 2000, Pages 178-179

  Murakami, Y ^a   Shingubara, S ^a   Sakaue, H ^a   Talahagi, T ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; COST REDUCTION; NANOSTRUCTURES; NANOTECHNOLOGY; OXIDATION;

HEXAGONAL ARRAYS; HIGH CAPABILITIES; HIGHLY ORDERED ARRAYS; LITHOGRAPHIC METHODS; PATTERNING METHODS; SELECTIVE ETCHING; SELF ORGANIZATIONS; SEMICONDUCTOR SUBSTRATE;

ANODIC OXIDATION;

EID: 84952065156     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IMNC.2000.872691     Document Type: Conference Paper

References (2)

1. S. Shingubara, O. Okino, Y. Sayama, H. Sakaue, and T. Takahagi, Jpn. J. Appl. Phys. 36 (1997) pp. 7791-7795
2. S. Shingubara, O. Okino, Y. Sayama, H. Sakaue, and T. Takahagi, Solid State Electronics 43 (1999) pp. 1143-1146.