High performance GeSi quantum-well PMOS on SIMOX

Technical Digest - International Electron Devices Meeting, IEDM

Volumn 1992-December, Issue , 1992, Pages 777-780

  Nayak, D K ^a   Park, J S ^a   Woo, J C S ^a   Wang, K L ^a   Yabiku, G K ^a,b   MacWilliams, K P ^a,b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b AEROSPACE CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MOSFET DEVICES; SEMICONDUCTOR QUANTUM WELLS;

EFFECTIVE CHANNEL MOBILITIES; PMOSFET;

SI-GE ALLOYS;

EID: 84951365882     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IEDM.1992.307473     Document Type: Conference Paper

References (9)

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8. D. K. Nayak, "Physics and Technology of GeSi Quantum-Well PMOSFETs", PhD Dissertation, IJniversity of California, Los Angeles, Aug. 1992.
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