Dense Nucleation of Polycrystalline Diamond Films Using CF4-H2 Low Pressure rf Discharges

Materials Science Monographs

Volumn 73, Issue C, 1991, Pages 583-588

  Rudder, R A ^a   Hudson, G C ^a   Malta, D P ^a   Posthill, J B ^a   Thomas, R E ^a   Markunas, R J ^a  

^a RTI INTERNATIONAL   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84951114425     PISSN: 01666010     EISSN: None     Source Type: Book Series    
DOI: 10.1016/B978-0-444-89162-4.50095-6     Document Type: Chapter

References (8)

1. Derjaguin, B., Fedoseev, V., Russ. Chem. Rev., 39, 1970, 783.
2. Matsumoto, S., Sato, Y., Kamo, M., Setaka, N., Jpn. J. Appl. Phys., 21, 1982, 183.
3. Hirose, Y., Teresawa, Y., Jpn. J. Appl. Phys., 25, 1986, L51.
4. Nakazawa, M., Nakashima, T., Seikai, S., Appl. Phys. Lett., 45, 1984, 823.
5. Kamo, M., Sato, Y., Matsumoto, S., Setaka, N., J. Cryst. Growth, 62, 1983, 642.
6. Matsumoto, S., Hiro, M., Kobayashi, T., Appl. Phys. Lett., 51, 1987, 737.
7. Kurihara, K., Sasaki, K., Kawarada, M., Koshiro, N., Appl. Phys. Lett., 52, 1988, 437.
8. Freedman, Andrew, Steinspring, Charles D., Appl. Phys. Lett., 57, 1990, 1194.