Novel Radio-Frequency Induction Plasma Processing Techniques

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 11, Issue 5, 1993, Pages 2487-2491

  Keller, John H ^a   Forster, John C ^a   Barnes, Michael S ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84951075359     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.578597     Document Type: Article

References (23)

1. N. Sakudo, K. Togkiguchi, H. Koike, and I. Kanomata, Rev. Sci. Intrum. 48, 762 (1972).
2. K. Suzuki, K. Ninomiya, S. Nishimatsu, and S. Okudaira, J. Vac. Sci. Technol. B 3, 1025 (1985).
3. W. M. Holber, in Handbook of Ion Beam Technology, Principles, Deposition, Film Modification and Synthesis, edited by J. J. Cuomo, S. M. Rossnagel, and H. R. Kaufman (Noyes, Park Ridge, NJ, 1989), p. 21.
4. L. Hinson, W. Class, and R. Sandstrom, in The Electrochemical Society Spring Meeting Extended Abstracts (The Electrochemical Society, New York, 1983), p. 254.
5. R. W. Boswell, A. J. Perry, and M. Emami, J. Vac. Sci. Technol. B 3, 3345 (1989).
6. C. B. Zarowin and C. W. Williams, Appl. Phys. Lett. 11, 47 (1967).
7. J. P. Goldsborough, E. B. Hodges, and W. E. Bell, Appl. Phys. Lett. 8, 137 (1966).
8. J. Freisinger, S. Reinneck, and H. W. Leob, in Proceedings of the 13th International Conference on Phenomena in Ionized Gases, 1977 (un-published), p. 703.
9. J. Freisinger, S. Reinneck, and H. W. Leob, in Proceedings of the 14th International Conference on Phenomena in Ionized Gases, 1979 (un-published), p. 477.
10. W. DiVergilio, H. Goede, and V. Fomight, TRW Report No. NAS3-22473, 1981 (unpublished).
11. W. DiVergilio, K. Ehlers, V. Fomight, D. Kippenhan, R. Pyle, and M. Vella, J. Vac. Sci. Technol. A 3, 1218 (1985).
12. R. Limpaecher and K. R. MacKenzie, Rev. Sci. Instrum. 44, 726 (1973).
13. K. N. Leung, R. E. Kribel, and G. R. Taylor, J. Appl. Phys. 47, 5245 (1976).
14. T. D. Mantei and T. E. Ryle, J. Vac. Sci. Technol. B 9, 29 (1991).
15. T. E. Wicker and T. D. Mantei, J. Appl. Phys. 57, 1638 (1985).
16. B. Petit and J. Pelletier, Jpn. J. Appl. Phys. 26, 825 (1987).
17. J. Keller, in Proceedings of the 33rd Gaseous Electronics Conference, 1989 (unpublished).
18. K. Kohler, J. Cobum, D. Horne, E. Kay, and J. Keller, J. Appl. Phys. 57, 59 (1985).
19. D. B. Ilic, Rev. Sci. Instrum. 52, 1542 (1981).
20. U.S. Patent 3,705,091 “Gas Discharge Apparatus.”
21. M. Yamashita, J. Vac. Sci. Technol. A 7, 151 (1989).
22. J. Amorin, H. S. Maciel, and J. P. Sudano, J. Vac. Sci. Technol. B 9, 362 (1991).
23. K. Chandrakar, J. Phys. D 11, 1809 (1978).